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类型:2020年,日韩论理片中文字 地区: 印度 年份:2020-07-12

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万方数据万方数据万方数据万方数据万方数据磁控溅射用CoCrPt系靶材制备技术研究进展作者:陈松, 耿永红, 王传军, 闻明, 张俊敏, 毕珺, 李艳琼, 谭志龙, 张昆华作者单位:昆明贵金属研究所稀贵金属综合利用新技术国家重点实验室,昆明,650106刊名:贵金属英文刊名:Precious Metals年,卷(期):2013,34(1)参考文献(24条)1.田民波薄膜技术与薄膜材料 20062.韩雪;夏慧;王燕记录媒体用磁控溅射靶材 1997(05)3.杨邦朝;崔红玲溅射靶材的制备与应用[期刊论文]-真空 2001(03)4.杨邦朝;胡永达;崔红玲溅射靶材的应用及发展趋势[期刊论文]-真空 2002(01)5.高桥由夫;中村敦;细江让垂直磁记录介质 20056.王大勇;顾小龙靶材制备研究现况及研发趋势[期刊论文]-浙江冶金 2007(04)7.Kazuteru Kato;Nobukazu Hayashi CoCrPt base sputtering target and production process for the same 20098.加藤和照;林信和CoCrPt系溅射靶材及其制造方法 20079.野中荘平;白井孝典磁记录膜用CoCrPt-SiO2溅射靶材的制造方法 200610.Chen Jung-Chih;Yuchen Shu-Hua;Hong In-Ting Method for manufacturing metal-based ceramic composite target containing noble metal 200911.张俊敏;闻明;李艳琼磁记录用Co-Cr-pt合金的制备及其表征[期刊论文]-贵金属 2011(01)12.张皓琨;刘丹敏;李洪宾采用EBSD方法研究高纯A1溅射靶材的微观结构[期刊论文]-电子显微学报 2008(06)13.吴丽君发展中的溅射靶材[期刊论文]-真空科学与技术 2001(04)14.金永中;刘冬亮;陈建溅射靶材的制备及应用研究[期刊论文]-四川理工学院学报(自然科学版) 2005(03)15.Sandlin M;Kunkel B;Zhang W Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal 200416.Sandlin M;Kunkel B;Zhang W Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidefied alloy powers and elemental Pt metal 200717.Zhang W Fabrication of B/C/N/O/Si doped sputtering targets 200418.Zhang W Sputter target and method for fabriacating sputter target including plurality of materials 200719.Zhang W Sputtering targets and methods for fabricating sputtering targets having multiple materials 200720.Zhang W Sputter target and method for fabricating sputter target including a plurality of materials 200721.Ziani A Enhanced formulation of cobalt alloy matrix composition 200622.Ziani A Enhanced sputter target manufacturing method 200723.Ziani A;Kunkel B Enhanced sputter target manufacturing method 200724.Ziani A;Kunkel B Enhanced sputter target manufacturing method 2008本文链接:http://d.g.wanfangdata.com.cn/Periodical_gjs201301017.aspx

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